dc.contributor.author | Yildirim, N. and Turut, A. and Dogan, H. | |
dc.date.accessioned | 2021-04-08T12:07:28Z | |
dc.date.available | 2021-04-08T12:07:28Z | |
dc.date.issued | 2018 | |
dc.identifier | 10.1142/S0218625X18500828 | |
dc.identifier.issn | 0218625X | |
dc.identifier.uri | https://www.scopus.com/inward/record.uri?eid=2-s2.0-85027063381&doi=10.1142%2fS0218625X18500828&partnerID=40&md5=77e61ebac0ae84553d9b5d45c00b96f3 | |
dc.identifier.uri | http://acikerisim.bingol.edu.tr/handle/20.500.12898/4340 | |
dc.description.abstract | The Schottky barrier type Ni/n-GaAs contacts fabricated by us were thermally annealed at 600°C and 700°C for 1min. The apparent barrier height Pdbl;ap and ideality factor of the diodes were calculated from the forward bias current-voltage characteristic in 60-320K range. The Pdbl;ap values for the nonannealed and 600°C and 700°C annealed diodes were obtained as 0.80, 0.81 and 0.67eV at 300K, respectively. Thus, it has been concluded that the reduced barrier due to the thermal annealing at 700°C promises some device applications. The current preferentially flows through the lowest barrier height (BH) with the temperature due to the BH inhomogeneities. Therefore, it was seen that the Pdbl;ap versus (2kT)-1 plots for the nonannealed and annealed diodes showed the linear behavior according to Gaussian distributions. © 2018 World Scientific Publishing Company. | |
dc.language.iso | English | |
dc.source | Surface Review and Letters | |
dc.title | CURRENT-VOLTAGE CHARACTERISTICS of THERMALLY ANNEALED Ni/ n -GaAs SCHOTTKY CONTACTS | |