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dc.contributor.authorYildirim, N. and Turut, A. and Dogan, H.
dc.date.accessioned2021-04-08T12:07:28Z
dc.date.available2021-04-08T12:07:28Z
dc.date.issued2018
dc.identifier10.1142/S0218625X18500828
dc.identifier.issn0218625X
dc.identifier.urihttps://www.scopus.com/inward/record.uri?eid=2-s2.0-85027063381&doi=10.1142%2fS0218625X18500828&partnerID=40&md5=77e61ebac0ae84553d9b5d45c00b96f3
dc.identifier.urihttp://acikerisim.bingol.edu.tr/handle/20.500.12898/4340
dc.description.abstractThe Schottky barrier type Ni/n-GaAs contacts fabricated by us were thermally annealed at 600°C and 700°C for 1min. The apparent barrier height Pdbl;ap and ideality factor of the diodes were calculated from the forward bias current-voltage characteristic in 60-320K range. The Pdbl;ap values for the nonannealed and 600°C and 700°C annealed diodes were obtained as 0.80, 0.81 and 0.67eV at 300K, respectively. Thus, it has been concluded that the reduced barrier due to the thermal annealing at 700°C promises some device applications. The current preferentially flows through the lowest barrier height (BH) with the temperature due to the BH inhomogeneities. Therefore, it was seen that the Pdbl;ap versus (2kT)-1 plots for the nonannealed and annealed diodes showed the linear behavior according to Gaussian distributions. © 2018 World Scientific Publishing Company.
dc.language.isoEnglish
dc.sourceSurface Review and Letters
dc.titleCURRENT-VOLTAGE CHARACTERISTICS of THERMALLY ANNEALED Ni/ n -GaAs SCHOTTKY CONTACTS


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